Dateline: Thu, 07 Apr 2005
freeNewsArticles Story Summary: “FRESNO, TX — (SEND2PRESS NEWSWIRE) — On March 31st, 2005, dignitaries and scientists from around the world were on hand to help celebrate the grand opening of a new addition of the state-of-the-art research and development center at Champion Technologies, Inc. The 35,000 square foot facility is located at Champion’s global research headquarters in Fresno, Texas.”
A R T I C L E:
FRESNO, TX — (SEND2PRESS NEWSWIRE) — On March 31st, 2005, dignitaries and scientists from around the world were on hand to help celebrate the grand opening of a new addition of the state-of-the-art research and development center at Champion Technologies, Inc. The 35,000 square foot facility is located at Champion’s global research headquarters in Fresno, Texas.
Photo Caption: On hand for the unveiling of the new facility were Tom Stavinoha, Fort Bend County Commissioner; James Patterson, Fort Bend County Commissioner; Earl McCauley, Champion Technologies Senior Project Engineer; Virgil Seale, Champion Technologies Director of R&D; Tom Amonett, Champion Technologies President & CEO; Grady Prestage, Fort Bend County Commissioner; Ben W. (Bud) Childers, Fort Bend County Attorney; Herb Appel, President – Fort Bend Economic Development Council.
Positioned strategically near the hub of the worldwide petroleum industry in Houston, the new facility is home to some 60 highly-trained research professionals, with 70, fully-equipped, individual work stations and access to the industry’s most advanced and sophisticated analytical equipment.
The new laboratories represent another major step in Champion’s continuing investment in facilities and capabilities, following the milestone achievement of the new technology center in Calgary, Alberta, Canada last year.
Champion designs and manufactures a complete line of unique and highly-effective proprietary specialty chemicals for the oil-and-gas industry. The sparkling new laboratories are designed to aid Champion’s teams of top-rated researchers in developing superior solutions for specific challenges facing customers in the field, reflecting Champion’s dedication to a customer-driven approach.
“These outstanding new laboratories significantly enhance our ability to create innovative products and tailor our services to the unique needs of our customers,” said Tom Amonett, Champion Technologies President and CEO. “Here, our researchers have access to a range of technological tools unsurpassed in the industry, everything they need to produce timely and effective answers for the challenging questions our customers pose.”
“This new facility epitomizes our company’s culture of excellence,” said Scott Knutson, Champion Technologies Vice President of Technology and Global Marketing. “We are proud that this new facility will help us respond more effectively to help our customers in their quest for energy worldwide.”
About Champion Technologies, Inc.
Since its beginnings in the early 1950s as Champion Chemicals, serving the rapidly growing oil industry in west Texas, Champion Technologies, Inc., has grown into a truly global organization and continues to experience steady growth by providing innovative products and exceptional service for customers worldwide. Today, most of the Company’s intermediates are manufactured in its Fresno, Texas complex. Most of its diluted or formulated products are made in Odessa, Texas; Calgary, Alberta, Canada; or at one of its international locations. The Fresno R&D and QC laboratories assure innovative solutions, effective products and accurate test results to diagnose customer problems.
Champion Technologies, 3355 West Alabama, Suite 400, Houston, Texas, USA 77098
WEBSITE: www.champ-tech.com
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Copyright © 2005 by Champion Technologies, Inc. and Send2Press® Newswire, a service of Neotrope® – all rights reserved. Information believed accurate but not guaranteed. Sourced on: freeNewsArticles.com.
• Story Title: Champion Technologies, Inc. Opens Cutting-Edge Research and Development Facility
• REFERENCE KEYWORDS/TERMS: , , , , Energy, Oil and Gas, , , .
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